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CMOS Wafer water cleaning machine

CMOS Wafer water cleaning machine

CMOS Wafer water cleaning machine
CategoriesCMOS Wafer water Cleaning machine
AlbumView larger image
BrandSAM
ModelSM-570
Update Time2018-11-14
Detail Information
Features 

Apply for cleaning camera module surface dust , through high pressure pure water washing and Water vapour two fluid cleaning , effectively remove Holder, CMOS ontology, such as Wafer surface dust particles.

Human-machine integration, one-button operation,fully automatic complete whole clean process.

With integration cleaning system.

Stainless steel machine cabinet ,Large  observation Windows, practical and beautiful;

Special design cleaning room,secondary  FFU air filtration,DI water and air open loop drain provide a clean environment for whole clean process;

Low energy consumption and low running noise;

Small compact appearance design, and less occupied area ,convenient deployment.

Whole system monitoring by instrument-ration, running stable and safety.

Automatic air filter , to ensure the cleaning effect.


Specification

Dimension

860L)*1000W)*1820H)mm

Clean method

Water vapour two fluid

Power supply

380V 10A 50Hz

Drying method

High speed centrifugal dehydration (ion wind assisted)

Pure water cleanliness

17M

Pure water filter precision

1μm

Pure water pressure

0.2MPa

Air filter precision

0.01μm

Compressed air capacity

8m³/min

Dust clean diameter

1μm98% above

compressed air pressure

0.4--0.75MPa

Max pure water consumption

10L/min

Material

machine body with 316 mirror stainless steel

Air consumption

5m³/min

Weight

300KG

Max work plate

Φ570mm

Control way

PLC+Touch screen

Max clean size

200L*140Wmm

Centrifugal clean pressure

0.15--1.4MPa

Work plate ration speed

0--2000r/min


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